Exhibit 99.1

FOR IMMEDIATE RELEASE

CYMER REPORTS SECOND QUARTER 2012 OPERATING RESULTS

SAN DIEGO, Calif., July 24, 2012 - Cymer, Inc. (Nasdaq: CYMI), the world’s leading supplier of light sources used by chipmakers to manufacture advanced semiconductor devices, today announced operating results for the second quarter ended June 30, 2012.

For the second quarter of 2012:

Commenting on results, Bob Akins, Cymer’s chief executive officer, said, “The second quarter of 2012 was an active and productive quarter. Higher gross pulses, a greater mix of ArF pulses, and continued light source installed base growth contributed to a rise in OnPulse revenue. Our deep ultraviolet (DUV) light source shipments grew from the prior quarter as we continued to satisfy requests for increased customer demand. Our extreme ultraviolet (EUV) source development and commercialization progress continued as we demonstrated improved expose power performance using prepulse and we realized significant improvement in extending collector lifetimes and the viability of collector refurbishment. We also began the integration and testing of our first EUV 3300 source. In addition, we completed qualification and customer acceptance of our first TCZ Gen 5 crystallization system, and entered into our first multi-year TCZ OnPulse agreement.”

In the second quarter of 2012, the company shipped 36 DUV light sources, of which 20 were ArF immersion, 2 were ArF dry and 14 were KrF, and the company installed 31 DUV light sources at chipmaker locations. Gross profit was $78.8 million for the second quarter of 2012, yielding a 52.8 percent gross margin. Total operating expenses, which include research and development and selling and administrative expenses, were $67.6 million. Total operating income was $11.2 million or eight percent of revenue.

DUV and Installed Base Products (IBP) bookings for the second quarter of 2012 totaled $154.7 million, resulting in a book-to-bill ratio of 1.09. Sixty-eight percent of the DUV unit bookings were ArF immersion and thirty-two percent were KrF. The company ended the quarter with a DUV backlog of approximately $69.0 million.

As of June 30, 2012, cash and investments totaled approximately $334 million.

- more -

Company Outlook

Commenting on the outlook for the third quarter of 2012, Akins stated, “We expect IBP revenue to continue to rise led by OnPulse and OnPulse enhancements. We anticipate shipping a slightly lower number of DUV light sources than the previous quarter. We also expect to recognize revenue on a TCZ crystallization tool. We continue to make progress on EUV source prepulse development and we expect to ship the first 3300 source to ASML this quarter. We remain committed to successful EUV source technology development and we will continue to invest in its performance scaling and commercialization.”

Based on information available at this time, Cymer is providing the following guidance for the third quarter of 2012:

Cymer’s management will hold a conference call at 2:00 pm (PDT) today, July 24, 2012, to discuss second quarter operating results and third quarter 2012 guidance. This press release, the conference call and accompanying slides may be accessed on the investor relations page of the company’s Web site at www.cymer.com.

- more -

Forward Looking Statements

Statements in this press release that are not strictly historical in nature are forward-looking statements. These statements include, but are not limited to statements regarding plans for the development and performance of the company’s EUV source technology, the company’s development of and manufacturing capability for its silicon crystallization tool for the display industry, expectations for growth in Installed Base Products revenue, and the statements under the caption “Company Outlook” above. These statements are predictions based on current information and expectations and involve a number of risks and uncertainties. In addition, statements regarding backlog and book-to-bill ratios should not be read as predictions or projections of future performance. Actual events or results may differ materially from those projected in any of such statements due to various factors, including but not limited to: the risk that the company’s EUV sources, which are still under development and not capable of supporting the commercial production of integrated circuits, may not meet customer specifications or may have reliability or performance problems; the risk that commercial EUV systems may not be introduced by the company on time, or at all; the risk that a competitor’s EUV or other source may be selected over the company’s EUV source; the demand for semiconductors in general, and, in particular, for leading-edge devices with smaller geometries; cyclicality in the market for semiconductor manufacturing equipment; the timing of customer orders, shipments and acceptances; delays or cancellations by customers of their orders; the performance and market acceptance of the company’s new products or technologies; new and enhanced product offerings by competitors; the company’s ability to meet its production and product development schedules; the rate at which semiconductor manufacturers adopt new technologies and purchase and take delivery of photolithography tools from the company’s customers; the company’s ability to secure adequate supplies of critical components for its advanced products; the company’s ability to manage its expense levels and unanticipated expenses; the company’s ability to achieve its forecasted gross margin which includes its ability to absorb manufacturing costs; the company’s ability to align its cost structure with forecasted business levels; the company’s ability to manage its foreign currency exposure; the performance and conditions in the United States and world financial markets; the policies and actions of the United States and other governments; and general economic conditions. For a discussion of these and other factors which may cause our actual events or results to differ from those projected, please refer to the company’s most recent annual report on Form 10-K and quarterly reports on Form 10-Q, as well as other subsequent filings with the Securities and Exchange Commission (SEC). You are cautioned not to place undue reliance on these forward-looking statements, which speak only as of the date of this press release. All forward-looking statements are qualified in their entirety by this cautionary statement, and the company undertakes no obligation to revise or update any forward-looking statements to reflect events or circumstances after the date of this press release.

About Cymer

Cymer, Inc. (Nasdaq: CYMI) is the market leader in developing light sources, used by chipmakers worldwide to pattern advanced semiconductor chips, and is pioneering a new silicon crystallization tool for the display industry. Cymer’s light sources have been widely adopted by the world’s top chipmakers and the company’s installed base comprises approximately 3,750 systems. Continuing its legacy of leadership, Cymer is currently pioneering the industry’s transition to EUV lithography, the next viable step on the technology roadmap for the creation of smaller, faster chips. The company is headquartered in San Diego, Calif., and supports its customers from numerous offices around the globe. Cymer maintains a Web site to which it regularly posts press releases, SEC filings, and additional information about Cymer. Interested persons can also subscribe to automated e-mail alerts or RSS feeds. Please visit www.cymer.com.

Cymer and all other Cymer product or service names used herein are either registered trademarks or trademarks of Cymer, Inc. Any other marks mentioned herein are the property of their respective holders.

- more -

CYMER, INC.

CONSOLIDATED STATEMENTS OF OPERATIONS (UNAUDITED)

(in thousands, except per share data)

- more -

CYMER, INC.

CONSOLIDATED BALANCE SHEETS (UNAUDITED)

(in thousands)

- more -

CYMER, INC.

CONSOLIDATED STATEMENTS OF CASH FLOWS (UNAUDITED)

(in thousands)

###